On the formation mechanisms, spatial resolution and intensity of backscatter Kikuchi patterns

Ultramicroscopy

Volumn 107, Issue 2-3, 2007, Pages 254-266

  Zaefferer, S ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Dynamical electron diffraction; Electron backscatter diffraction pattern; Spatial resolution; Thermal diffuse scattering

Indexed keywords

COMPUTER SIMULATION; ELECTRON DIFFRACTION; ELECTRON SCATTERING; MEASUREMENT THEORY; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY;

DYNAMICAL ELECTRON DIFFRACTION; ELECTRON BACKSCATTER DIFFRACTION PATTERN; SPATIAL RESOLUTION; THERMAL DIFFUSE SCATTERING;

BACKSCATTERING;

NIOBIUM; SILICON;

ARTICLE; ELECTRON DIFFRACTION; MEASUREMENT; MONTE CARLO METHOD; SCANNING ELECTRON MICROSCOPE; TECHNIQUE; THEORETICAL STUDY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33845612753     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2006.08.007     Document Type: Article

References (39)

1. Venables J.A., and Harland C.J. Philos. Mag. 27 (1973) 1193
2. Dingley D.J. Proc. R. Microsc. Soc. 19 (1984) 74
3. Krieger Lassen N.C., Juul Jensen D., and Conradsen K. Scanning Microsc. 6 (1992) 115
4. Adams B.L., Wright S.I., and Kunze K. Met. Trans. 24A (1993) 819
5. Wilkinson A.J., and Hirsch P.B. Micron 28 (1997) 279
6. Schwarzer R.A. Micron 28 (1997) 249
7. In: Schwartz A.J., Kumar M., and Adams B.L. (Eds). Electron Backscatter Diffraction in Material Science (2000), Kluwer Academic/Plenum Publishers, New York
8. Goldstein J., et al. Scanning Electron Microscopy and X-Ray Microanalysis. third ed (2003), Springer Science, New York
9. Zaefferer S. Mater. Sci. Forum Vols. 495-479 (2005) 3
10. Ren S.X., Kenik E.A., Alexander K.B., and Goyal A. Microsc. Microanal. 4 (1998) 23
11. Isabell T.C., and Dravid V.P. Ultramicroscopy 67 (1997) 59
12. Humphreys F.J. J. Mater. Sci. 36 (2001) 3833
13. Dingley D.J. J. Microsc. 213 (2004) 214
14. Baba-Kishi K.Z., and Dingley D.J. Scanning 11 (1989) 305
15. Michael J.R., and Goehner R.P. MSA Bull. 23 (1993) 168
16. Michael J.R., and Eades J.A. Ultramicroscopy 81 (2000) 67
17. Nowell M.M., and Wright S.I. J. Microsc. 213 (2004) 296
18. Kikuchi S. Jpn. J. Phys. 5 (1928) 83
19. Nishikawa S., and Kikuchi S. Proc. Imperial Acad. (Japan) 4 (1928) 475
20. Hirsch P.B., Howie A., Nicholson R.B., Pashley D.W., and Whelan M.J. Electron Microscopy of Thin Crystals (1965), Butterworth, London
21. L. Reimer, Transmission Electron Microscopy: Physics of Image Formation and Microanalysis, vol. 36, fourth ed., Springer Series in Optical Sciences, Berlin, 1997.
22. Tanaka M., Terauchi M., Tsuda K., and Saitoh K. Convergent-Beam Electron Diffraction IV (2002), JEOL Ltd, Tokyo
23. Omoto K., Tsuda K., and Tanaka M. J. Electron. Micosc. 51 (2002) 67
24. Wang Z.L. Elastic and Inelastic Scattering in Electron Diffraction and Imaging (1995), Plenum Press, New York
25. Reimer L., Heilers U., and Saliger G. Scanning 8 (1986) 101
26. Joy D.C., Newbury D.E., and Davidson D.L. J. Appl. Phys. 53 (1982) R81
27. Dudarev S.L., Rez P., and Whelan M.J. Phys. Rev. B 51 (1995) 3397
28. Wells O. Scanning 21 (1999) 368
29. Joy D.C. Proc. EMSA (1994) 592
30. Reimer L. Scanning Electron Microscopy: Physics of Image Formation and Microanalysis Vol. 45 (1985), Springer Series in Optical Sciences, Berlin
31. Drouin D., et al. CASINO V. 2.42: Monte Carlo Simulation of Electron Trajectories in Solids (2001), Universite de Sherbrooke, Sherbrooke Canada
32. Wang Z.L. Micron 34 (2003) 141
33. Dingley D.J., and Field D.P. Mater. Sci. Technol. 13 (1997) 69
34. Pouchou J.L. L'analyse EBSD, Principes et applications (2004), EDP Sciences, Les Ulis
35. Zaefferer S. J. Appl. Crystallogr. 33 (2000) 10
36. Zaefferer S. Advances in Imaging and Electron Physics 125 (2002) 355
37. Blackman M. Proc. R. Soc. A 173 (1939) 68
38. Horstmann M., and Meyer G. Acta Crystallogr. 15 (1962) 271
39. Krieger-Lassen. N.C. Mater. Sci. Forum 273-275 (1998) 201