Low- and high-temperature controls in carbon nanofiber growth in reactive plasmas

Nanotechnology

Volumn 21, Issue 45, 2010, Pages

  Mehdipour, H ^a   Ostrikov, K ^b,c   Rider, A E ^b,c  

^a SAHAND UNIVERSITY OF TECHNOLOGY   (Iran)

^b CSIRO   (Australia)

^c UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON FLUXES; CATALYST SURFACES; CATALYST TEMPERATURE; CATALYZED GROWTHS; ETCHING GAS; GAS PRESSURES; GROWTH CHARACTERISTIC; GROWTH PARAMETERS; HIGH ASPECT RATIO; HIGHER TEMPERATURES; ION TEMPERATURE; LOW TEMPERATURE PLASMAS; NANO DEVICE; NUMERICAL GROWTH; PROCESS TEMPERATURE; REACTIVE PLASMAS; SHEATH PARAMETERS; SUBSTRATE POTENTIAL; SURFACE COVERAGES;

ASPECT RATIO; CATALYSIS; CATALYSTS; HYDROCARBONS; PLASMA SHEATHS;

CARBON NANOFIBERS;

EID: 77958559595     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/45/455605     Document Type: Article

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