Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon

Journal of Applied Physics

Volumn 79, Issue 7, 1996, Pages 3718-3729

  Mantzaris, Nikolaos V ^a,b   Gogolides, Evangelos ^a   Boudouvis, Andreas G ^b   Rhallabi, Ahmed ^c   Turban, Guy ^c  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^c Inst de Phys et Chim des Mat   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000591011     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361205     Document Type: Article

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