Low-pressure PECVD of nanoparticles in carbon thin films from Ar/H 2/C2H2 plasmas: Synthesis of films and analysis of the electron energy distribution function

Chemical Vapor Deposition

Volumn 13, Issue 6-7, 2007, Pages 326-334

  Camero, Manuel ^a   Gordillo Vázquez, Francisco J ^b   Gómez Aleixandre, Cristina ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTO DE ÓPTICA   (Spain)

Author keywords

C2H2; Carbon nanoparticles; OES; Plasma EEDF; RF CVD

Indexed keywords

AMORPHOUS CARBON; ATOMIC SPECTROSCOPY; CARBON; CONCENTRATION (PROCESS); DISSOCIATION; DISTRIBUTION FUNCTIONS; ELECTRIC POWER DISTRIBUTION; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LEVELS; ELECTRONS; EMISSION SPECTROSCOPY; ION BEAMS; MOLECULAR SPECTROSCOPY; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PROBABILITY DENSITY FUNCTION; THICK FILMS; THIN FILMS;

AMORPHOUS STRUCTURES; AR ATOMS; C2H2; CARBON NANOPARTICLES; CARBON NANOSPHERES; CARBON THIN FILMS; CONCENTRATION THRESHOLDS; DEPOSITED FILMS; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; OES; PLASMA KINETICS; RADIOFREQUENCY; RELATIVE CONCENTRATIONS; RF-CVD; SUPERELASTIC COLLISIONS; SYNTHESIS OF; TEMPORAL EVOLUTIONS;

CARBON FILMS;

EID: 54949105837     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606554     Document Type: Article

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