Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 666-673

  Tamm, Aile ^a   Heikkilä, Mikko ^b   Kemell, Marianna ^b   Kozlova, Jekaterina ^a   Kukli, Kaupo ^a,b   Sammelselg, Väino ^a   Ritala, Mikko ^b   Leskelä, Markku ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition; Crystallization; Diffraction and reflection; Electrical transport (conductivity, resistivity, mobility, etc.); Insulating films; Oxides; Rare earth metals; Thin film structures; X ray scattering

Indexed keywords

DIFFRACTION AND REFLECTION; ELECTRICAL TRANSPORT (CONDUCTIVITY , RESISTIVITY , MOBILITY , ETC.); INSULATING FILM; RARE EARTH METALS; THIN FILM STRUCTURES;

ASPECT RATIO; ATOMIC LAYER DEPOSITION; CRYSTALLIZATION; DEPOSITION; DIELECTRIC PROPERTIES; DIFFRACTION; ERBIUM; INSULATING MATERIALS; OZONE; PLASTIC FILMS; RARE EARTHS; SCATTERING; THIN FILMS; VAPOR DEPOSITION; X RAY SCATTERING; ZIRCONIA; ZIRCONIUM; ZIRCONIUM ALLOYS;

ATOMS;

EID: 77958492994     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.111     Document Type: Article

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