Er2 O3 as a high- K dielectric candidate

Applied Physics Letters

Volumn 91, Issue 9, 2007, Pages

  Losurdo, Maria ^a   Giangregorio, Maria M ^a   Bruno, Giovanni ^a   Yang, Dongxing ^b   Irene, Eugene A ^b   Suvorova, Alexandra A ^c   Saunders, M ^c  

^a CNR   (Italy)

^b University of North Carolina at Chapel Hill

^c UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ERBIUM COMPOUNDS; FILM THICKNESS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PASSIVATION; PERMITTIVITY; SILICATES;

ERBIUM OXIDE; FILMS STRUCTURE; STATIC DIELECTRIC CONSTANT; SURFACE PASSIVATION;

THIN FILMS;

EID: 34548437639     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2775084     Document Type: Article

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