-
1
-
-
0032515024
-
-
T. Ishikawa, S. Kajii, K. Matsunaga, T. Hogami, Y. Kohtoku, and T. Nagasawa, Science 282, 1295 (1998).
-
(1998)
Science
, vol.282
, pp. 1295
-
-
Ishikawa, T.1
Kajii, S.2
Matsunaga, K.3
Hogami, T.4
Kohtoku, Y.5
Nagasawa, T.6
-
2
-
-
4344658558
-
-
0028-0836 10.1038/nature02810
-
D. Nakamura, I. Gunjishima, S. Yamaguchi, T. Ito, A. Okamoto, H. Kondo, S. Onda, and K. Takatori, Nature (London) 0028-0836 10.1038/nature02810 430, 1009 (2004).
-
(2004)
Nature (London)
, vol.430
, pp. 1009
-
-
Nakamura, D.1
Gunjishima, I.2
Yamaguchi, S.3
Ito, T.4
Okamoto, A.5
Kondo, H.6
Onda, S.7
Takatori, K.8
-
3
-
-
20944449316
-
-
0003-6951 10.1063/1.1920434
-
F. Liao, S. L. Girshick, W. M. Mook, W. W. Gerberich, and M. R. Zachariah, Appl. Phys. Lett. 0003-6951 10.1063/1.1920434 86, 171913 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 171913
-
-
Liao, F.1
Girshick, S.L.2
Mook, W.M.3
Gerberich, W.W.4
Zachariah, M.R.5
-
4
-
-
0000395353
-
-
0003-6951 10.1063/1.126350
-
S. Kerdiles, A. Berthelot, F. Gourbilleau, and R. Rizk, Appl. Phys. Lett. 0003-6951 10.1063/1.126350 76, 2373 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 2373
-
-
Kerdiles, S.1
Berthelot, A.2
Gourbilleau, F.3
Rizk, R.4
-
5
-
-
33644605490
-
-
1070-664X 10.1063/1.2173957
-
S. Y. Huang, S. Xu, J. D. Long, Z. Sun, and T. Chen, Phys. Plasmas 1070-664X 10.1063/1.2173957 13, 023506 (2006); S. Xu, K. Ostrikov, J. D. Long, and S. Y. Huang, Vacuum 80, 621 (2006).
-
(2006)
Phys. Plasmas
, vol.13
, pp. 023506
-
-
Huang, S.Y.1
Xu, S.2
Long, J.D.3
Sun, Z.4
Chen, T.5
-
6
-
-
32844460931
-
-
S. Y. Huang, S. Xu, J. D. Long, Z. Sun, and T. Chen, Phys. Plasmas 1070-664X 10.1063/1.2173957 13, 023506 (2006); S. Xu, K. Ostrikov, J. D. Long, and S. Y. Huang, Vacuum 80, 621 (2006).
-
(2006)
Vacuum
, vol.80
, pp. 621
-
-
Xu, S.1
Ostrikov, K.2
Long, J.D.3
Huang, S.Y.4
-
7
-
-
18844426248
-
-
0093-3813 10.1109/TPS.2005.845339
-
M. Xu, V. M. Ng, S. Y. Huang, J. D. Long, and S. Xu, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845339 33, 242 (2005); K. Ostrikov, J. D. Long, P. P. Rutkevych, and S. Xu, Vacuum 80, 1126 (2006).
-
(2005)
IEEE Trans. Plasma Sci.
, vol.33
, pp. 242
-
-
Xu, M.1
Ng, V.M.2
Huang, S.Y.3
Long, J.D.4
Xu, S.5
-
8
-
-
33748081438
-
-
M. Xu, V. M. Ng, S. Y. Huang, J. D. Long, and S. Xu, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845339 33, 242 (2005); K. Ostrikov, J. D. Long, P. P. Rutkevych, and S. Xu, Vacuum 80, 1126 (2006).
-
(2006)
Vacuum
, vol.80
, pp. 1126
-
-
Ostrikov, K.1
Long, J.D.2
Rutkevych, P.P.3
Xu, S.4
-
10
-
-
29044436038
-
-
J. Y. Fan, X. L. Wu, H. X. Li, H. W. Liu, G. S. Huang, G. G. Siu, and P. K. Chu, Appl. Phys. A: Mater. Sci. Process. 82, 485 (2006).
-
(2006)
Appl. Phys. A: Mater. Sci. Process.
, vol.82
, pp. 485
-
-
Fan, J.Y.1
Wu, X.L.2
Li, H.X.3
Liu, H.W.4
Huang, G.S.5
Siu, G.G.6
Chu, P.K.7
-
11
-
-
23844483659
-
-
0021-8979 10.1063/1.1985975
-
H. Colder, R. Rizk, M. Morales, P. Marie, J. Vicens, and I. Vickridge, J. Appl. Phys. 0021-8979 10.1063/1.1985975 98, 024313 (2005).
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 024313
-
-
Colder, H.1
Rizk, R.2
Morales, M.3
Marie, P.4
Vicens, J.5
Vickridge, I.6
-
13
-
-
0242335615
-
-
0021-8979 10.1063/1.1609642
-
X. L. Wu, Y. Gu, S. J. Xiong, J. M. Zhu, G. S. Huang, X. M. Bao, and G. G. Siu, J. Appl. Phys. 0021-8979 10.1063/1.1609642 94, 5247 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 5247
-
-
Wu, X.L.1
Gu, Y.2
Xiong, S.J.3
Zhu, J.M.4
Huang, G.S.5
Bao, X.M.6
Siu, G.G.7
-
15
-
-
31544464617
-
-
0003-6951 10.1063/1.2168018
-
J. Y. Fan, X. L. Wu, H. X. Li, H. W. Liu, G. G. Siu, and P. K. Chu, Appl. Phys. Lett. 0003-6951 10.1063/1.2168018 88, 041909 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 041909
-
-
Fan, J.Y.1
Wu, X.L.2
Li, H.X.3
Liu, H.W.4
Siu, G.G.5
Chu, P.K.6
-
16
-
-
0041917684
-
-
0003-6951 10.1063/1.1599967
-
H. C. Lo, D. Das, J. S. Hwang, K. H. Chen, C. H. Hsu, C. F. Chen, and L. C. Chen, Appl. Phys. Lett. 0003-6951 10.1063/1.1599967 83, 1420 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 1420
-
-
Lo, H.C.1
Das, D.2
Hwang, J.S.3
Chen, K.H.4
Hsu, C.H.5
Chen, C.F.6
Chen, L.C.7
-
17
-
-
0036732227
-
-
0021-8979 10.1063/1.1500418
-
K. Chew, Rusli, S. F. Yoon, J. Ahn, V. Ligatchev, E. J. Teo, T. Osipowicz, and F. Watt, J. Appl. Phys. 0021-8979 10.1063/1.1500418 92, 2937 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 2937
-
-
Chew, K.1
Rusli2
Yoon, S.F.3
Ahn, J.4
Ligatchev, V.5
Teo, E.J.6
Osipowicz, T.7
Watt, F.8
-
19
-
-
30344463283
-
-
M. Keidar, Y. Raitses, A. Knapp, and A. M. Waas, Carbon 44, 1022 (2006).
-
(2006)
Carbon
, vol.44
, pp. 1022
-
-
Keidar, M.1
Raitses, Y.2
Knapp, A.3
Waas, A.M.4
-
20
-
-
1642413462
-
-
E. I. Waldorff, A. M. Waas, P. P. Friedmann, and M. Keidar, J. Appl. Phys. 95, 2749 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 2749
-
-
Waldorff, E.I.1
Waas, A.M.2
Friedmann, P.P.3
Keidar, M.4
-
23
-
-
2942659777
-
-
0021-8979 10.1063/1.1711175
-
H. J. Kim, Z. M. Zhao, J. Liu, V. Ozolins, J. Y. Chang, and Y. H. Xie, J. Appl. Phys. 0021-8979 10.1063/1.1711175 95, 6065 (2004).
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 6065
-
-
Kim, H.J.1
Zhao, Z.M.2
Liu, J.3
Ozolins, V.4
Chang, J.Y.5
Xie, Y.H.6
-
24
-
-
10444285394
-
-
0948-1907 10.1002/cvde.200306300
-
J. Shieh, T. S. Ko, H. L. Chen, B. T. Dai, and T. C. Chu, Chem. Vap. Deposition 0948-1907 10.1002/cvde.200306300 10, 265 (2004).
-
(2004)
Chem. Vap. Deposition
, vol.10
, pp. 265
-
-
Shieh, J.1
Ko, T.S.2
Chen, H.L.3
Dai, B.T.4
Chu, T.C.5
-
25
-
-
26244451229
-
-
0034-6861 10.1103/RevModPhys.77.489
-
K. Ostrikov, Rev. Mod. Phys. 0034-6861 10.1103/RevModPhys.77.489 77, 489 (2005).
-
(2005)
Rev. Mod. Phys.
, vol.77
, pp. 489
-
-
Ostrikov, K.1
-
26
-
-
4944231890
-
-
0003-6951 10.1063/1.1787943
-
T. P. Munt, D. E. Jesson, V. A. Shchukin, and D. Bimberg, Appl. Phys. Lett. 0003-6951 10.1063/1.1787943 85, 1784 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 1784
-
-
Munt, T.P.1
Jesson, D.E.2
Shchukin, V.A.3
Bimberg, D.4
-
27
-
-
2442668161
-
-
0953-8984 10.1088/0953-8984/16/17/001
-
F. Rosei, J. Phys.: Condens. Matter 0953-8984 10.1088/0953-8984/16/17/001 16, S1373 (2004).
-
(2004)
J. Phys.: Condens. Matter
, vol.16
, pp. 1373
-
-
Rosei, F.1
-
28
-
-
0037504072
-
-
0163-1829 10.1103/PhysRevB.67.155403
-
F. Gibou, C. Ratsch, and R. Caflisch, Phys. Rev. B 0163-1829 10.1103/PhysRevB.67.155403 67, 155403 (2003).
-
(2003)
Phys. Rev. B
, vol.67
, pp. 155403
-
-
Gibou, F.1
Ratsch, C.2
Caflisch, R.3
-
30
-
-
0029492434
-
-
T. Doi, M. Ichikawa, S. Hosoki, and K. Ninomiya, Surf. Sci. 343, 24 (1995).
-
(1995)
Surf. Sci.
, vol.343
, pp. 24
-
-
Doi, T.1
Ichikawa, M.2
Hosoki, S.3
Ninomiya, K.4
-
32
-
-
0003998388
-
-
87th ed., edited by D. R.Lide (Taylor and Francis, Boca Raton, FL
-
CRC Handbook of Chemistry and Physics, Internet Version, Sec. 12, 87th ed., edited by, D. R. Lide, (Taylor and Francis, Boca Raton, FL, 2007).
-
(2007)
CRC Handbook of Chemistry and Physics
-
-
-
35
-
-
33847634957
-
-
The stoichiometric precursor influx ratio k=1 is most commonly used in many gas-based deposition processes because of the commonsense expectation to achieve a stoichiometric elemental ratio of the elements constituting the quantum dots.
-
The stoichiometric precursor influx ratio kp =1 is most commonly used in many gas-based deposition processes because of the commonsense expectation to achieve a stoichiometric elemental ratio of the elements constituting the quantum dots.
-
-
-
-
36
-
-
33847641869
-
-
The duration of this stage can be estimated t=θ P+, where θ is the required surface coverage.
-
The duration of this stage can be estimated t=θ P+, where θ is the required surface coverage.
-
-
-
-
37
-
-
33847628114
-
-
It should be stressed that the surface temperature by itself does not influence the equilibrium quantum dot composition provided that adatom re-evaporation from the surface is weak enough. After a certain time lag (which depends on the process conditions), the elemental composition of the QDs reproduces that of the precursor influx. However, the nonequilibrium QD composition at the initial stage of deposition can significantly affect the nanodot structure at later growth stages.
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It should be stressed that the surface temperature by itself does not influence the equilibrium quantum dot composition provided that adatom re-evaporation from the surface is weak enough. After a certain time lag (which depends on the process conditions), the elemental composition of the QDs reproduces that of the precursor influx. However, the nonequilibrium QD composition at the initial stage of deposition can significantly affect the nanodot structure at later growth stages.
-
-
-
-
38
-
-
33748572262
-
-
X. Y. Tian, C. J. Ruan, P. Cui, W. T. Liu, J. Zheng, X. Zhang, X. Y. Yao, K. Zheng, and Y. Li, J. Macromol. Sci., Phys. 45, 835 (2006).
-
(2006)
J. Macromol. Sci., Phys.
, vol.45
, pp. 835
-
-
Tian, X.Y.1
Ruan, C.J.2
Cui, P.3
Liu, W.T.4
Zheng, J.5
Zhang, X.6
Yao, X.Y.7
Zheng, K.8
Li, Y.9
-
39
-
-
7644229911
-
-
0925-9635 10.1016/j.diamond.2004.06.010
-
Z. L. Tsakadze, K. Ostrikov, J. D. Long, and S. Xu, Diamond Relat. Mater. 0925-9635 10.1016/j.diamond.2004.06.010 13, 1923 (2004); Z. L. Tsakadze, K. Ostrikov, and S. Xu, Surf. Coat. Technol. 191, 49 (2005).
-
(2004)
Diamond Relat. Mater.
, vol.13
, pp. 1923
-
-
Tsakadze, Z.L.1
Ostrikov, K.2
Long, J.D.3
Xu, S.4
-
40
-
-
10244221122
-
-
Z. L. Tsakadze, K. Ostrikov, J. D. Long, and S. Xu, Diamond Relat. Mater. 0925-9635 10.1016/j.diamond.2004.06.010 13, 1923 (2004); Z. L. Tsakadze, K. Ostrikov, and S. Xu, Surf. Coat. Technol. 191, 49 (2005).
-
(2005)
Surf. Coat. Technol.
, vol.191
, pp. 49
-
-
Tsakadze, Z.L.1
Ostrikov, K.2
Xu, S.3
-
41
-
-
0242468482
-
-
0021-8979 10.1063/1.1618356
-
I. B. Denysenko, K. Ostrikov, S. Xu, M. Y. Yu, and C. H. Diong, J. Appl. Phys. 0021-8979 10.1063/1.1618356 94, 6097 (2003); K. N. Ostrikov, S. Xu, A. B. M. S. Azam, J. Vac. Sci. Technol. A 20, 251 (2002).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 6097
-
-
Denysenko, I.B.1
Ostrikov, K.2
Xu, S.3
Yu, M.Y.4
Diong, C.H.5
-
42
-
-
0036164589
-
-
I. B. Denysenko, K. Ostrikov, S. Xu, M. Y. Yu, and C. H. Diong, J. Appl. Phys. 0021-8979 10.1063/1.1618356 94, 6097 (2003); K. N. Ostrikov, S. Xu, A. B. M. S. Azam, J. Vac. Sci. Technol. A 20, 251 (2002).
-
(2002)
J. Vac. Sci. Technol. A
, vol.20
, pp. 251
-
-
Ostrikov, K.N.1
Xu, S.2
Azam, A.B.M.S.3
|