One-dimensional analysis of the rate of plasma-assisted sputter deposition

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Palmero, A ^a,b   Rudolph, H ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CATHODES; FILM GROWTH; GERMANIUM; SILICON; TANTALUM; TUNGSTEN;

GAS ATOMS; PLASMA-ASSISTED SPUTTER DEPOSITION; SPUTTERED MATERIAL;

SPUTTER DEPOSITION;

EID: 34247572519     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2720257     Document Type: Conference Paper

References (21)

1. J. M. Schneider, S. Rohde, W. D. Sproul, and A. Matthews, J. Phys. D 0022-3727 10.1088/0022-3727/33/18/201 33, 173 (2000).
2. S. Berg and T. Nyberg, Thin Solid Films 0040-6090 10.1016/j.tsf.2004.10. 051 476, 215 (2005).
3. A. Palmero, H. Rudolph, and F. H. P. M. Habraken, Appl. Phys. Lett. 89, 211501 (2006). 0003-6951
4. J. H. Keller, and R. G. Simmons, IBM J. Res. Dev. 23, 24 (1979).
5. T. P. Drüsedau, M. Lohmann, and B. Garke, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.581408 16, 2728 (1998).
6. T. P. Drüsedau, Surf. Coat. Technol. 174-175, 470 (2003).
7. T. Drüsedau, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1450586 20, 459 (2002).
8. I. Knittel, M. Gothe, and U. Hartmann, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.2091197 23, 1714 (2005).
9. S. Mahieu, G. Buyle, D. Depla, S. Heirwegh, P. Ghekiere, and R. de Gryse, Nucl. Instrum. Methods Phys. Res. B 243, 313 (2006). 0168-583X
10. L. R. Shaginyan, J. G. Han, V. R. Shaginyan, and J. Musil, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.2210947 24, 1083 (2006).
11. J. J. van Hapert, A. M. Vredenberg, E. E. van Faassen, N. Tomozeiu, W. M. Arnoldbik, and F. H. P. M. Habraken, Phys. Rev. B 0163-1829 10.1103/PhysRevB.69.245202 69, 245202 (2004).
12. H. C. Swart, E. D. van Hattum, W. M. Arnoldbik, and F. H. P. M. Habraken, Phys. Status Solidi A 1, 2286 (2004).
13. V. M. Burlakov, G. A. D. Briggs, A. P. Sutton, A. Bongiorno, and A. Pasquarello, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.93.135501 93, 135501 (2004).
14. J. A. Thornton, Thin Solid Films 0040-6090 10.1016/0040-6090(78)90273-0 54, 23 (1978).
15. J. A. Thornton and J. L. Lamb, Thin Solid Films 0040-6090 10.1016/0040-6090(84)90160-3 119, 87 (1984).
16. A. Palmero, H. Rudolph, and F. H. P. M. Habraken, Appl. Phys. Lett. 0003-6951 10.1063/1.2010609 87, 071501 (2005).
17. F. Jimenez, S. D. Ekpe, and S. K. Dew, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.2210005 24, 1530 (2006).
18. A. Bogaerts and R. Gijbels, J. Anal. At. Spectrom. 19, 1206 (2004).
19. M. Amberg, J. Geerk, M. Keller, and A. Fischer, Plasma Devices Oper. 12, 175 (2004).
20. A. Palmero, E. D. van Hattum, H. Rudolph, and F. H. P. M. Habraken, Eur. Phys. J. D 41 (2), 303 (2007).
21. W. D. Westwood, J. Vac. Sci. Technol. 0022-5355 10.1116/1.569429 15, 1 (1978).