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Volumn 2, Issue , 2009, Pages 853-856
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Effect of targets used on preparation of impurity-doped ZnO transparent electrodes by dc magnetron sputtering deposition
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CONVENTIONAL DC MAGNETRON SPUTTERING;
DC MAGNETRON SPUTTERING;
DEPOSITION CONDITIONS;
DOPED ZNO;
GA-DOPED ZNO;
KEY FACTORS;
MAGNETRON-SPUTTERING DEPOSITION;
OXYGEN CONTENT;
PRACTICAL USE;
RESISTIVITY DISTRIBUTIONS;
SUBSTRATE SURFACE;
TRANSPARENT ELECTRODE;
CONDUCTIVE FILMS;
CRYSTAL IMPURITIES;
DEPOSITION;
GALLIUM;
GALLIUM ALLOYS;
LIQUID CRYSTAL DISPLAYS;
LIQUID CRYSTALS;
MAGNETRON SPUTTERING;
OXYGEN;
SPUTTER DEPOSITION;
TARGETS;
THIN FILMS;
ZINC OXIDE;
FILM PREPARATION;
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EID: 77954158867
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (13)
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