New transparent conducting Al-doped ZnO film preparation techniques for improving resistivity distribution in magnetron sputtering deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 12-16, 2006, Pages

  Minami, Tadatsugu ^a   Miyata, Toshihiro ^a   Ohtani, Yuusuke ^a   Mochizuki, Yuu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Al doped ZnO; AZO; Magnetron sputtering; Thin film; Transparent conducting oxide; Transparent electrode; Zinc oxide; ZnO

Indexed keywords

ALUMINUM; ELECTRIC CONDUCTIVITY; HYDROGEN; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; SEMICONDUCTOR DOPING; THIN FILMS;

AL-DOPED ZNO; AZO; RESISTIVITY DISTRIBUTION; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT ELECTRODE;

ZINC OXIDE;

EID: 33646490764     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L409     Document Type: Article

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