Transparent conducting Al-doped ZnO thin films prepared by magnetron sputtering with dc and rf powers applied in combination

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1172-1177

  Minami, Tadatsugu ^a   Ohtani, Yuusuke ^a   Miyata, Toshihiro ^a   Kuboi, Takeshi ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; DOPING (ADDITIVES); HYDROGEN; MAGNETRON SPUTTERING; THIN FILMS;

RESISTIVITY DISTRIBUTION; TRANSPARENT CONDUCTING; TRANSPARENT CONDUCTING FILMS;

ZINC OXIDE;

EID: 34547275743     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2748809     Document Type: Article

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