Design and fabrication of a planar three-DOFs MEMS-based manipulator

Journal of Microelectromechanical Systems

Volumn 19, Issue 5, 2010, Pages 1116-1130

  De Jong, Boudewijn R ^a   Brouwer, Dannis M ^b   De Boer, Meint J ^c   Jansen, Henri V ^c   Soemers, Herman M J R ^a,b   Krijnen, Gijs J M ^c  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF TWENTE   (Netherlands)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Compliant mechanism; electrostatic actuators; exact constraint design; multidegrees of freedom; nanometer positioning; precision engineering; trench isolation

Indexed keywords

COMPLIANT MECHANISM; EXACT CONSTRAINT DESIGN; MULTI-DEGREES OF FREEDOMS; NANOMETER POSITIONING; TRENCH ISOLATION;

ACTUATORS; ASPECT RATIO; DESIGN; ELECTROSTATIC ACTUATORS; ELECTROSTATICS; FABRICATION; MANIPULATORS; MASKS; MECHANICAL ENGINEERING; MECHANISMS; MODAL ANALYSIS; PRECISION ENGINEERING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUSPENSIONS (FLUIDS); TRANSMISSION ELECTRON MICROSCOPY; VIBRATION ANALYSIS;

SUSPENSIONS (COMPONENTS);

EID: 77957591553     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2067196     Document Type: Article

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