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Volumn 19, Issue 11, 2010, Pages 1393-1400

Some novel aspects of nanocrystalline diamond nucleation and growth by direct current plasma assisted chemical vapor deposition

Author keywords

Cathode temperature; Direct current plasma assisted CVD; Nanocrystalline diamond film; Nucleation

Indexed keywords

4-IN. SI; AVERAGE DIAMETER; CATHODE TEMPERATURE; CHAMBER PRESSURE; CRYSTALLINITIES; DIAMOND POWDERS; DIRECT CURRENT PLASMAS; DISCHARGE VOLTAGES; GAS FLOWRATE; GRAIN SIZE; INJECTION TIMING; NANOCRYSTALLINE DIAMOND FILM; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NCD FILMS; NEXAFS AND RAMAN SPECTROSCOPY; NUCLEATION AND GROWTH; NUCLEATION DENSITIES; SEM; SUBSTRATE TEMPERATURE; XRD;

EID: 77957345104     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.08.006     Document Type: Article
Times cited : (10)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.