Nanocrystalline diamond films deposited by the hot cathode direct current plasma chemical vapor deposition method with different compositions of CH 4/Ar/H2 gas mixture

Journal of Physical Chemistry C

Volumn 112, Issue 5, 2008, Pages 1401-1406

  Zeng, Leyong ^a,b   Peng, Hongyan ^c   Wang, Weibiao ^a   Chen, Yuqiang ^c   Lei, Da ^a,b   Qi, Wentao ^c   Liang, Jingqiu ^a   Zhao, Jialong ^a   Kong, Xianggui ^a   Zhang, Hong ^d  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c MUDANJIANG NORMAL UNIVERSITY   (China)

^d UNIVERSITY OF AMSTERDAM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; DEPOSITION; DIAMOND FILMS; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

GRAIN SIZES; SURFACE SMOOTHNESS;

GAS MIXTURES;

EID: 39649108856     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp710082n     Document Type: Article

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