Generation of pulsed direct-current plasma above 100 torr for large area diamond deposition

Diamond and Related Materials

Volumn 10, Issue 12, 2001, Pages 2220-2224

  Lee, W S ^a   Chae, K W ^b   Eun, K Y ^a   Baik, Y J ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Precision Diamond Co   (South Korea)

Author keywords

DC plasma CVD; Deposition; Diamond films; Plasma

Indexed keywords

ELECTRODES; EMISSION SPECTROSCOPY; FILM GROWTH; PLASMA STABILITY; THERMAL EFFECTS; THICK FILMS;

OPTICAL EMISSION SPECTROSCOPY;

DIAMOND FILMS;

PLASMA TREATMENT;

EID: 0035576960     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00511-8     Document Type: Article

References (10)