X-ray photoelectron spectroscopy analysis of zirconium nitride-like films prepared on Si(100) substrates by ion beam assisted deposition

Surface and Coatings Technology

Volumn 202, Issue 13, 2008, Pages 3129-3135

  Matsuoka, M ^a   Isotani, S ^a   Sucasaire, W ^a   Kuratani, N ^b   Ogata, K ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b OMRON CORPORATION   (Japan)

^c NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

81.15.Jj; 81.65.Tx; 82.80.Pv; Gettering; Ion beam assisted deposition; X ray photoelectron spectroscopy; Zirconium nitride coating

Indexed keywords

CARBON; ION BEAM ASSISTED DEPOSITION; NITROGEN; OXYGEN; SILICON; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING STRUCTURE; ZIRCONIUM NITRIDE;

ZIRCONIUM COMPOUNDS;

CARBON; ION BEAM ASSISTED DEPOSITION; NITROGEN; OXYGEN; SILICON; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

EID: 44349142870     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.11.019     Document Type: Article

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