High-rate deposition of copper thin films using newly designed high-power magnetron sputtering source

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 721-727

  Boo, Jin Hyo ^a   Jung, Min Jae ^a   Park, Heon Kyu ^a   Nam, Kyung Hoon ^a   Han, Jeon G ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Copper thin film; High rate deposition; Ion extraction grid; Optical emission spectroscopy; Unbalanced high power magnetron sputter source

Indexed keywords

CARBON; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; GLASS; IMPURITIES; IONS; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; OXYGEN; SPUTTER DEPOSITION; THIN FILMS;

CARBOM AND OXYGEN IMPURITIES; COPPER THIN FILMS; GLASS SUBSTRATES;

COPPER;

FILM;

EID: 14644413542     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.005     Document Type: Article

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