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Surface Science

Volumn 604, Issue 19-20, 2010, Pages 1628-1636

Full field chemical imaging of buried native sub-oxide layers on doped silicon patterns

(5) De La Pena F a Barrett, N b Zagonel, L F a Walls, M a Renault, O c

a UNIVERSITÉ PARIS SACLAY (France)

b DIF (France)

c CEA LETI (France)

Author keywords

Photoelectron emission; Photoelectron emission microscopy (XPEEM); Semiconductor insulator interfaces; Semiconductor semiconductor thin film structures; Silicon oxides; Synchrotron radiation photoelectron spectroscopy

Indexed keywords

PHOTO-ELECTRON EMISSION; PHOTOELECTRON EMISSION MICROSCOPY (XPEEM); SEMICONDUCTOR THIN FILMS; SEMICONDUCTOR-INSULATOR INTERFACES; SYNCHROTRON RADIATION PHOTOELECTRON SPECTROSCOPY;

BINDING ENERGY; CURVE FITTING; DOPING (ADDITIVES); NUCLEAR ENERGY; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTONS; PIXELS; POTENTIAL ENERGY; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS; SILICON OXIDES; SIZE DISTRIBUTION; SPECTROSCOPIC ANALYSIS; SYNCHROTRON RADIATION; SYNCHROTRONS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77956263818 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2010.06.006 Document Type: Article

Times cited : (19)

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