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Influence of sputtering conditions on microstructure and mechanical properties of Zr-Si-N films prepared by rf reactive sputtering
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sixth edition. 1st edition.
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Zhou M., Nose M., Deguchi Y., Mae T., Nogi K. Influence of sputtering conditions on microstructure and mechanical properties of Zr-Si-N films prepared by rf reactive sputtering. J. Vac. Sci. Technol. 2003, A21(5):1791-1795.
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(2003)
J. Vac. Sci. Technol.
, vol.A21
, Issue.5
, pp. 1791-1795
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Zhou, M.1
Nose, M.2
Deguchi, Y.3
Mae, T.4
Nogi, K.5
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