Microstructure of physical vapour deposited Ti-Si-N coatings

Materials Research Society Symposium - Proceedings

Volumn 704, Issue , 2002, Pages 175-180

  Kauffmann, Florian ^a   Dehm, Gerhard ^a   Arzt, Eduard ^a   Schier, Veit ^a   Henke, Sascha ^a   Schattke, Alexander ^a   Beck, Thomas ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CRYSTAL MICROSTRUCTURE; HARDNESS; MECHANICAL PROPERTIES; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; SILICON; TEXTURES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FOCUSED ION BEAM MICROSCOPY; SINGLE LAYER COATING; TITANIUM SILICON NITRIDE;

TITANIUM COMPOUNDS;

EID: 0036375747     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)