Microstructure and mechanical properties of Ti-Si-N coatings

Journal of Materials Research

Volumn 17, Issue 10, 2002, Pages 2628-2632

  Meng, W J ^a   Zhang, X D ^a   Shi, B ^a   Tittsworth, R C ^a   Rehn, L E ^a   Baldo, P M ^a  

^a Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; INDENTATION; INDUCTIVELY COUPLED PLASMA; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL); TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

AMORPHOUS SILICON NITRIDE; ATOMIC SHORT-RANGE ORDER; INSTRUMENTED NANOINDENTATION; X-RAY ABSORPTION NEAR-EDGE STRUCTURE SPECTROSCOPY;

COATINGS;

EID: 0036806725     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0381     Document Type: Article

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