Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content

Thin Solid Films

Volumn 478, Issue 1-2, 2005, Pages 238-247

  Musil, J ^a   Daniel, R ^a   Zeman, P ^a   Takai, O ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

DC reactive magnetron sputtering; High ( 25 at. ) Si content; Mechanical properties; Oxidation resistance; Structure; Zr Si N films

Indexed keywords

ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MICROHARDNESS; NITROGEN; OXIDATION RESISTANCE; SILICON; SUBSTRATES; ZIRCONIUM;

BINARY NITRIDES; DC REACTIVE MAGNETRON SPUTTERING; HIGH SI CONTENT; ZR-SI-N FILMS;

THIN FILMS;

EID: 14644394301     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.190     Document Type: Article

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