Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzer

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6320-6324

  Setsuhara, Yuichi ^a,d   Cho, Ken ^a,d   Takenaka, Kosuke ^a,d   Shiratani, Masaharu ^b,d   Sekine, Makoto ^c,d   Hori, Masaru ^c,d  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Combinatorial method; Density inclination plasma; Plasma analysis; Plasma nano fabrication; Plasma nano science; Plasma polymer interaction

Indexed keywords

ADVANCED RESEARCHES; ARGON-OXYGEN MIXTURES; COMBINATORIAL METHOD; DENSITY-INCLINATION PLASMA; ETCHING CHARACTERISTICS; ETCHING DEPTH; ETCHING PROPERTIES; EXPOSURE-TIME; ION DOSE; ION SATURATION CURRENT; LINEAR DEPENDENCE; PLASMA ANALYSIS; PLASMA EXPOSURE; PLASMA PROCESSING; POLYMER INTERACTIONS; PROCESS ANALYSIS; PROCESS ANALYZERS; PROCESS CONDITION; PROCESS PARAMETERS; SUBSTRATE HOLDERS;

ARGON; ETCHING; INDUSTRIAL RESEARCH; IONS; MORPHOLOGY; OXYGEN; POLYETHYLENE TEREPHTHALATES; POLYMERS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THERMOPLASTICS;

PLASMAS;

EID: 77956062489     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.055     Document Type: Conference Paper

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