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Volumn 54, Issue 11, 2010, Pages 1447-1450
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Influence of sputtering pressure on morphological, mechanical and electrical properties of Al-doped ZnO films
b
SNTEK
(South Korea)
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Author keywords
Doping; Sputtering; Thin film; Transparent conductive oxide; ZnO
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Indexed keywords
AL-DOPED ZNO;
AZO FILMS;
COST TRANSPARENT;
DOPING;
ELECTRICAL RESISTIVITY;
ELECTRONIC DEVICE;
GLASS SUBSTRATES;
HIGH TRANSMITTANCE;
MECHANICAL AND ELECTRICAL PROPERTIES;
N-TYPE CONDUCTIVITY;
PULSED DC SPUTTERING;
SPUTTERED FILMS;
SPUTTERING PRESSURES;
TRANSPARENT CONDUCTIVE OXIDES;
VISIBLE RANGE;
WORKING PRESSURES;
ZNO;
ALUMINUM;
CARRIER CONCENTRATION;
CARRIER MOBILITY;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
LANTHANUM COMPOUNDS;
OPTICAL FILMS;
SUBSTRATES;
THIN FILMS;
ZINC OXIDE;
MECHANICAL PROPERTIES;
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EID: 77955659555
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/j.sse.2010.07.002 Document Type: Article |
Times cited : (68)
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References (27)
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