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Volumn 54, Issue 11, 2010, Pages 1447-1450

Influence of sputtering pressure on morphological, mechanical and electrical properties of Al-doped ZnO films

Author keywords

Doping; Sputtering; Thin film; Transparent conductive oxide; ZnO

Indexed keywords

AL-DOPED ZNO; AZO FILMS; COST TRANSPARENT; DOPING; ELECTRICAL RESISTIVITY; ELECTRONIC DEVICE; GLASS SUBSTRATES; HIGH TRANSMITTANCE; MECHANICAL AND ELECTRICAL PROPERTIES; N-TYPE CONDUCTIVITY; PULSED DC SPUTTERING; SPUTTERED FILMS; SPUTTERING PRESSURES; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE RANGE; WORKING PRESSURES; ZNO;

EID: 77955659555     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2010.07.002     Document Type: Article
Times cited : (68)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.