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Volumn 21, Issue 3, 2009, Pages 6-13

Rotatable Magnetron Sputter Technology for Large Area Glass and Web CoatingZylindrische Magnetron Sputter Technologie f̈r Architekturglasbeschichtung und Web Coating

Author keywords

[No Author keywords available]

Indexed keywords

COATING APPLICATION; COATING TECHNOLOGIES; COST OF OWNERSHIP; HIGH QUALITY; LARGE-AREA COATING; LARGE-AREA SUBSTRATES; LAYER PARAMETERS; MAGNETRON SPUTTER; RIGID AND FLEXIBLE SUBSTRATES; SPUTTERING TECHNOLOGY; SYSTEM THROUGHPUT; TARGET MATERIALS; TARGET TECHNOLOGY;

EID: 68949216305     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200900384     Document Type: Article
Times cited : (11)

References (13)
  • 3
    • 0141748228 scopus 로고    scopus 로고
    • Equipment, materials and processes: A review of high rate sputtering technology for glass coating
    • S.J. Nadel et al., "Equipment, materials and processes: a review of high rate sputtering technology for glass coating", Thin Solid Films, 442, 11, 2003.
    • (2003) Thin Solid Films , vol.442 , pp. 11
    • Nadel, S.J.1
  • 4
    • 68949207399 scopus 로고    scopus 로고
    • GB-232R sputtering targets and sputtering films: Technology and markets
    • M. Rittner, "GB-232R Sputtering Targets and Sputtering Films: Technology and Markets, 2002", Business Communications Company Inc
    • (2002) Business Communications Company Inc
    • Rittner, M.1
  • 5
    • 68949216656 scopus 로고    scopus 로고
    • New sputter targets and sputter hardware offering further cost reductions for large area coatings
    • September
    • W. De Bosselier et al., "New Sputter Targets and Sputter Hardware offering Further Cost Reductions for Large Area Coatings", Vacuum Technology and Coatings, September 2005.
    • (2005) Vacuum Technology and Coatings
    • De Bosselier, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.