Correlation of electrical and morphological properties of sputtered aluminum nitride films with deposition temperature

Current Applied Physics

Volumn 6, Issue 5, 2006, Pages 873-876

  Kar, J P ^a   Bose, G ^a   Tuli, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

AlN; C V; Sputtering; Temperature; XRD

Indexed keywords

ALUMINUM NITRIDE; CRYSTAL ORIENTATION; ELECTRIC PROPERTIES; GRAIN SIZE AND SHAPE; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TEMPERATURE; X RAY DIFFRACTION;

C-V; CRYSTALLINITY; DEPOSITION TEMPERATURE; INTERFACE STATE DENSITY;

THIN FILMS;

EID: 33745234848     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.05.001     Document Type: Article

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