Improvement of a-Si solar cell properties by using SnO2:F TCO films coated with an ultra-thin TiO2 layer prepared by APCVD

Solar Energy Materials and Solar Cells

Volumn 90, Issue 18-19, 2006, Pages 3014-3020

  Kambe, M ^a   Fukawa, M ^a   Taneda, N ^a   Sato, K ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Open circuit voltage; Titanium oxide; Transparent conductive oxide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; TITANIUM OXIDES; ULTRATHIN FILMS; X RAY DIFFRACTION;

OPEN CIRCUIT VOLTAGE; SPECTROSCOPIC ELLIPSOMETRY; TRANSPARENT CONDUCTIVE OXIDE;

SILICON SOLAR CELLS;

EID: 33748297506     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2006.06.008     Document Type: Article

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