RF-superimposed DC and pulsed DC sputtering for deposition of transparent conductive oxides

Thin Solid Films

Volumn 515, Issue 19 SPEC. ISS., 2007, Pages 7654-7657

  Stowell, Michael ^a   Müller, Joachim ^b   Ruske, Manfred ^c   Lutz, Mark ^d   Linz, Thomas ^d  

^a APPLIED MATERIALS INC   (United States)

^b Applied Materials GmbH and Co KG   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

^d Advanced Energy Industries GmbH   (Germany)

Author keywords

Arc handling; ITO; Pulsing frequency; RF superimposed pulsed DC sputtering

Indexed keywords

CONDUCTIVE MATERIALS; ELECTRIC GENERATORS; FILM GROWTH; FLAT PANEL DISPLAYS; SOLAR CELLS; SPUTTERING;

ARC HANDLING; INDIUM TIN OXIDE (ITO); PULSING FREQUENCY; RF-SUPERIMPOSED PULSED DC SPUTTERING;

OXIDE FILMS;

EID: 34547597228     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.166     Document Type: Article

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