Preparation and characterization of Al and Mn doped ZnO (ZnO: (Al, Mn)) transparent conducting oxide films

Journal of Solid State Chemistry

Volumn 177, Issue 4-5, 2004, Pages 1480-1487

  Cao, H T ^a   Pei, Z L ^a   Gong, J ^a   Sun, C ^a   Huang, R F ^a   Wen, L S ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

68.55.Jk; 73.61.Ga; 78.66.Hf; 81.15.Cd; 82.80.Pv; DC reactive magnetron sputtering; Electro optical properties; Structural properties; Transparent conducting oxide; XPS

Indexed keywords

ALUMINUM; ATTENUATION; DOPING (ADDITIVES); ELECTROOPTICAL EFFECTS; MAGNETRON SPUTTERING; MANGANESE; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND GAP; HYBRIDIZATION;

ZINC OXIDE;

ALUMINUM; MANGANESE; OXYGEN; ZINC OXIDE;

ARTICLE; ELECTRIC ACTIVITY; FILM; HYBRIDIZATION; MICROWAVE OVEN; OPTICAL ROTATION; ROOM TEMPERATURE; STRUCTURE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 1642421813     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jssc.2003.11.030     Document Type: Article

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