Combined spectroscopic ellipsometry and attenuated total reflection analyses of Al2O3/HfO2 nanolaminates

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5057-5060

  Bonvalot, M ^a   Kahn, M ^a   Vallee C ^a   Gourvest, E ^a   Abed, H ^a   Jorel, C ^a   Dubourdieu, C ^b  

^a CEA LETI   (France)

^b LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

Al2O3; HfO2; High oxide; Nanolaminate

Indexed keywords

AL2O3; AMORPHOUS PHASE; ATOMIC VAPOR DEPOSITION; ATTENUATED TOTAL REFLECTION SPECTROSCOPY; ATTENUATED TOTAL REFLECTIONS; CRYSTALLISATION; DIELECTRIC STACK; HFO2; NANO-LAMINATES; NANOLAMINATE;

ALUMINUM; ATOMIC SPECTROSCOPY; CRYSTALLIZATION; ELECTROMAGNETIC WAVE REFLECTION; SPECTROSCOPIC ELLIPSOMETRY; VAPOR DEPOSITION;

HAFNIUM COMPOUNDS;

EID: 77955654191     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.034     Document Type: Article

References (20)

1. E.P. Gusev, C. Cabral Jr., M. Copel, C. D'Emic, and M. Gribelyuk Microelectron. Eng. 69 2003 145
2. X. Yu, C. Zhu, H. Hu, A. Chin, M.F. Li, and B.J. Cho IEEE Electron. Dev. Lett. 24 2003 64
3. B.H. Lee, L. Kang, W.J. Qi, R. Nieh, Y. Jeon, K. Onishi, and J.C. Lee Tech. Dig.-Int. Electron. Devices Meet. 1999 133
4. E.E. Hoppe, R.C. Aita, and M. Gajdardziska-Josifovska Appl. Phys. Lett. 91 2007 203105
5. C. Dubourdieu, E. Rauwel, C. Millon, P. Chaudouët, F. Ducroquet, N. Rochat, S. Rushworth, and V. Cosnier Chem. Vap. Deposition 12 2006 187
6. G. Molas, M. Bocquet, J. Buckley, H. Grampeix, M. Gély, J.P. Colonna, C. Licitra, N. Rochat, T. Veyront, X. Garros, F. Martin, P. Brianceau, V. Vidal, C. Bongiorno, S. Lombardo, B. De Salvo, and S. Deleonibus Solid State Electron. 51 2007 1540
7. B. Govoreanu, R. Degraeve, M.B. Zahid, L. Nyns, M. Cho, B. Kaczer, M. Jurczak, J.A. Kittl, and J. Van Houdt Microelectron. Eng. 86 2009 1807
8. V.V. Afanas'ev, and A. Stesmans J. Appl. Phys. 102 2007 081301
9. S.J. Ding, D.W. Zhang, and L.K. Wang J. Phys. D: Appl. Phys. 40 2007 1072
10. M. Kahn, C. Vallée, E. Defay, C. Dubourdieu, M. Bonvalot, S. Blonkowski, J.R. Plaussu, P. Garrec, and T. Baron Microelectron. Reliab. 47 2007 773
11. N. Rochat, K. Dabertrand, V. Cosnier, S. Zoll, P. Besson, and U. Weber Phys. Status Solidi 8 2003 2965
12. G.E. Jellison Jr, and F.A. Modine Appl. Phys. Lett. 69 1996 371
13. G.E. Jellison Jr, and F.A. Modine Appl. Phys. Lett. 69 1996 2137
14. F. Ferrieu, K. Dabertrand, S. Lhostis, V. Ivanova, E. Martinez, C. Licitra, and G. Rolland J. Non-Cryst. Solids 353 2007 658
15. Y.J. Cho, N.V. Nguyen, C.A. Richter, J.R. Ehrstein, B.H. Lee, and J.C. Lee Appl. Phys. Lett. 80 2002 1249
16. C. Licitra, E. Martinez, N. Rochat, T. Veyron, H. Grampeix, M. Gely, J.P. Colonna, and G. Molas AIP Conf. Proc. 931 2007 292
17. N.T. Mc Devitt, and W.L. Baun Spectrochim. Acta 20 1964 799
18. N.T. Rochat, A. Chabli, F. Bertin, M. Olivier, C. Vergnaud, and P. Mur J. Appl. Phys. 91 2002 5029
19. S.J. Kim, B.J. Cho, M.F. Li, S.J. Ding, C. Zhu, M.B. Yu, B. Narayanan, A. Chin, and D.L. Kwong IEEE Electron. Device Lett. 25 2004 538
20. C. Durand, C. Vallée, C. Dubourdieu, M. Kahn, M. Derivaz, S. Blonkowski, D. Jalabert, P. Holliger, Q. Fang, and I.W. Boyd J. Vac. Sci. Technol. A 24 2006 459