Infrared spectroscopy of high k thin layer by multiple internal reflection and attenuated total reflection

Physica Status Solidi C: Conferences

Volumn , Issue 8, 2003, Pages 2961-2965

  Rochat, N ^a   Dabertrand, K ^b   Cosnier, V ^b   Zoll, S ^b   Besson, P ^b   Weber, U ^c  

^a CEA GRENOBLE   (France)

^b STMICROELECTRONICS   (France)

^c AIXTRON AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATED TOTAL REFLECTIONS; HIGH SENSITIVITY; INTERFACE EVOLUTION; METAL ORGANIC CHEMICAL VAPOUR DEPOSITIONS; MORPHOLOGY AND COMPOSITION; MULTIPLE INTERNAL REFLECTIONS; OPTICAL CONFIGURATIONS; THIN SILICON OXIDE;

DEPOSITS; ELECTROMAGNETIC WAVE REFLECTION; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON OXIDES;

HAFNIUM OXIDES;

EID: 84875122994     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200303858     Document Type: Conference Paper

References (19)

1. N. Rochat, M. Olivier, F. Conne, G. Lefeuvre, and C. Boll-Burdet, Appl. Phys. Lett. 77(14), 2249 (2000).
2. M. Olivier, N. Rochat, A. Chabli, G. Lefeuvre, and F. Conne, Mat. Sc. in Semicon. Process. 4, 15 (2001).
3. N. Rochat, A. Troussier, A. Hoang, and F. Vinet, Mat. Sc. Eng. C 23, 99 (2003).
4. N. Rochat, A. Chabli, F. Bertin, M. Olivier, C. Vergnaud, and P. Mur, J. Appl. Phys. 91/8, 5029 (2002).
5. N. Rochat, A. Chabli, F. Bertin, C. Vergnaud, P. Mur, S. Petitdidier, and P. Besson, to be published in Mater. Sci. Eng C.
6. V. Cosnier, H. Bender, M. Caymax, J. Chen, T. Conard, H. Nohira, O. Richard, W. Tsai, W. Vandervorst, E. Yuoung, C. Zhao, S. De Gendt, M. Heyns, J. W. H. Maes, M. Tuominen, N. Rochat, M. Olivier, and A. Chabli, IWGI 2001, IEEE No 01EX537, 226 (2001).
7. N. Rochat, M. Olivier, A. Chabli, F. Conne, and G. Lefeuvre Appl. Phys. Lett. 77, 2249 (2000).
8. J. E. Olsen and F. Shimura, J. Appl. Phys. 66, 1353 (1989).
9. S. Petitdidier, N. Rochat, D. Rouchon, P. Besson, Solid state phenomena, 92, 187 (2003).
10. N. J. Harrick, internal reflection spectroscopy, Wiley, New York 1967.
11. N. T. McDevitt, W. L. Baun, Spectrochem. Acta, 20 799 (1964).
12. Y. Morisaki, Y. Sugita, K. Irino, T. Aoyama, IWGI 2001, 184].
13. JCPDS n°34-0104 of the American Society for Testing and Materials.
14. M. Morstein, I. Pozsgai, N. D. Spencer, Chem, Vap. Dep. 5(4), 151, 1999.
15. K. Nakanishi and P. H. Solomon, Infrared absorption spectroscopy, Holden Day, Oakland, CA, 1977.
16. G. Lucovsky, J. Vac. Sci. Technol., 16 1225 (1979).
17. rd ed., CRC press, Boca Raton, 1982-1983.
18. R. R. Razouk and B. E. Deal, J. Electrochem. Soc. 129(4), 806 (1982).
19. T. Dittrich, T. Burke, and F. Koch, J. Appl. Phys. 89(8), 4636 (2001).