Room-temperature nanoimprinting using liquid-phase hydrogen silsesquioxane with hard poly(dimethylsiloxane) mold

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Kang, Yuji ^a,b   Okada, Makoto ^a,b,c   Minari, Chiaki ^a   Kanda, Kazuhiro ^a,b   Haruyama, Yuichi ^a,b   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARBITRARY PATTERNS; BI-LAYER STRUCTURE; ETCHING MASKS; HIGH THROUGHPUT; HYDROGEN SILSESQUIOXANE; LIQUID PHASE; LOW PRESSURES; NANO-IMPRINTING; PDMS MOLDS; RESIDUAL LAYERS; ROOM TEMPERATURE; SUBMICRON;

LIQUIDS; MICROCHANNELS; MOLDS;

ELECTRON BEAM LITHOGRAPHY;

EID: 77955335622     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GL13     Document Type: Article

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