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Volumn 45, Issue 20-23, 2006, Pages

Nanoimprinting using liquid-phase hydrogen silsesquioxane

Author keywords

Hydrogen silsesquioxane (HSQ); Liquid phase; Lithography; Low pressure; Nanoimprint; Thin residual layer

Indexed keywords

FABRICATION; LITHOGRAPHY; RESINS; SPIN COATING; THICKNESS MEASUREMENT;

HYDROGEN SILSESQUIOXANE (HSQ); LIQUID PHASE; LOW PRESSURE; NANOIMPRINT; THIN RESIDUAL LAYER;

NANOTECHNOLOGY;

EID: 33745306255 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.L546 Document Type: Article

Times cited : (23)

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