Actinic mask inspection using an EUV microscope - Preparation of a Mirau interferometer for phase-defect detection

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5474-5478

  Hamamoto, Kazuhiro ^a,d   Tanaka, Yuzuru ^a,d   Kawashima, Hirotake ^a,d   Lee, Seung Yoon ^a,d   Hosokawa, Nobuyuki ^b,d   Sakaya, Noriyuki ^c,d   Hosoya, Morio ^c,d   Shoki, Tsutomu ^c,d   Watanabe, Takeo ^a,d   Kinoshita, Hiroo ^a,d  

^a UNIVERSITY OF HYOGO   (Japan)

^b Nitto Thin Film Laboratories Co Ltd   (Japan)

^c HOYA CORPORATION   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

EUVL; Mask defect; Phase shift interferometer; PZT actuator; Schwarzschild optics; X ray zooming tube

Indexed keywords

EUVL; MASK DEFECT; PHASE-SHIFT INTERFEROMETER; PZT ACTUATOR; X-RAY ZOOMING TUBE;

ACTUATORS; INTERFEROMETERS; MIRRORS; ULTRAVIOLET RADIATION;

MICROSCOPIC EXAMINATION;

EID: 31844437724     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5474     Document Type: Article

References (13)

1. T. Watanabe, H. Kinoshita, K. Hamamoto, M. Hosoya, T. Shoki, H. Hada, H, Komano and S. Okazaki: Jpn. J. Appl. Phys. 41 (2002) 4105.
2. Semiconductor Industry Association, "International Technology Roadmap for Semiconductors: 2004 update: Lithography" Austin TX, International SEMATECH.
3. T. Hashimoto, H. Yamanashi, S. Miyagaki and I. Nishiyama: Proc. SPIE 5446 (2004) 860.
4. D. Pettibone and S. Stokowski: Proc. SPIE 5567 (2004) 807.
5. M. Yi, T. Haga, C. Walton and J. Bokor: J. Vac. Sci. & Technol. B 19 (2001) 2401.
6. T. Terasawa, Y. Tezuka, M. Ito and T. Tomie: Proc. SPIE 5446 (2004) 804.
7. Y. Tezuka, M. Ito, T. Terasawa and T. Tomie: Proc. SPIE 5446 (2004) 870.
8. T. Haga, H. Takenaka and M. Fukuda: J. Vac. Sci. & Technol. B 18 (2000) 2916.
9. T. Haga, H. Kinoshita, K. Hamamoto, S. Takada, N. Kazui, S. Kakunai, H. Tsubakino and T. Watanabe: Jpn. J. Appl. Phys. 42 (2003) 3771.
10. H. Kinoshita, T. Haga, K. Hamamoto, S. Takada, N. Kazui, S. Kakunai, H. Tsubakino, T. Shoki, M. Endo and T. Watanabe: J. Vac. Sci. & Technol. B 22 (2004) 264.
11. K. Yamamoto, S. Yamaguchi and Y. Terada: IEEE Trans. NS-32 (1985) 438.
12. P. Hariharan, B. F. Oreb and T. Eiju: Appl. Opt. 26 (1987) 2504.
13. D. Rugar, H. J. Mamin and P. Guethner: Appl. Phys. Lett. 55 (1989) 2588.