Structure of copolymer films created by plasma enhanced chemical vapor deposition

Polymer

Volumn 51, Issue 17, 2010, Pages 3971-3977

  Peri, Someswara R ^a   Kim, Hyeonjae ^a   Akgun, Bulent ^a   Enlow, Jesse ^b   Jiang, Hao ^b   Bunning, Timothy J ^b   Li, Xuefa ^c   Foster, Mark D ^a  

^a UNIVERSITY OF AKRON   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Plasma copolymerization; Plasma enhanced chemical vapor deposition

Indexed keywords

BENZENE; DIELECTRIC MATERIALS; INTERFACES (MATERIALS); PLASMA CVD; REFRACTIVE INDEX; SILICON COMPOUNDS; SILICON OXIDES; X RAY SCATTERING;

HEXAMETHYLDISILOXANE; INTERFACE STRUCTURES; NON-LINEAR VARIATION; OPTICAL APPLICATIONS; PLASMA COPOLYMERIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); SCATTERING LENGTH DENSITY; SILICON-OXIDE INTERFACES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

COPOLYMER; FEED; FILM; INTERFACIAL PROPERTY; MONOMER; OPTICAL PROPERTY; PLASMA TREATMENT; REFLECTIVE PROPERTY; SUBSTRATE; VAPOR; X-RAY ANALYSIS;

EID: 77955320228     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2010.06.055     Document Type: Article

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