Microstructures formation by fluorocarbon barrel plasma etching

International Journal of Plasma Science and Engineering

Volumn 2008, Issue , 2008, Pages

  El amrani, A ^a   Tadjine, R ^b   Moussa, F Y ^a  

^a Silicon Technology   (Algeria)

^b CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBON PLASMA BARREL TEXTURING; LIGHT TRAPPING; MONOCRYSTALLINESILICON; SURFACE TEXTURING;

LIGHT ABSORPTION; LIGHT REFLECTION; MICROPOROUS MATERIALS; SECONDARY ION MASS SPECTROMETRY; TEXTURES; TRANSPARENCY;

MICROCRYSTALLINE SILICON;

EID: 77955312963     PISSN: 16876245     EISSN: 16876253     Source Type: Journal    
DOI: 10.1155/2008/371812     Document Type: Article

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