Silicon oxide selective etching process keeping harmony with environment by using radical injection technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3260-3264

  Fujita, Kazushi ^a   Ito, Masafumi ^a   Hori, Masaru ^a   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033422843     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582052     Document Type: Article

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