PECVD siloxane and fluorine-based copolymer thin films

Chemical Vapor Deposition

Volumn 14, Issue 9-10, 2008, Pages 286-291

  Jiang, Hao ^a   Eyink, Kurt ^b   Grant, John T ^c   Enlow, Jesse ^b   Tullis, Scott ^b   Bunning, Timothy J ^b  

^a Materials Sci and Tech Applications LLC   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF DAYTON   (United States)

Author keywords

FTIR; Optics; Plasma polymerization; Thin films; XPS

Indexed keywords

ABS RESINS; CHEMICAL REACTIONS; COPOLYMERIZATION; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; LIGHT REFRACTION; MONOMERS; OPTICAL PROPERTIES; ORGANIC POLYMERS; PHOTOELECTRON SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMER FILMS; POLYMERIZATION; POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; SPECTRUM ANALYSIS; THICK FILMS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPOLYMER THIN FILMS; CROSSLINKED NETWORKS; DEFLUORINATION; EXTINCTION COEFFICIENTS; FEED RATIOS; FOURIER TRANSFORM INFRARED; FTIR; HEXAMETHYLDISILOXANE; INTERNAL STRUCTURES; NONLINEAR RELATIONSHIPS; PHOTONIC FILMS; PLASMA COPOLYMERIZATIONS; VOLUME RATIOS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS;

OPTICAL FILMS;

EID: 55349114692     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200806684     Document Type: Article

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