Atomic force microscopy and X-ray reflectivity studies of albumin adsorbed onto self-assembled monolayers of hexadecyltrichlorosilane

Langmuir

Volumn 14, Issue 16, 1998, Pages 4535-4544

  Sheller, N B ^a   Petrash, S ^a   Foster, M D ^a   Tsukruk, V V ^b  

^a The University of Akron   (United States)

^b Parkview Campus   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; BODY FLUIDS; BOND STRENGTH (CHEMICAL); ELECTROMAGNETIC WAVE REFLECTION; MOLECULAR STRUCTURE; MONOLAYERS; SILANES; SILICON WAFERS; X RAY ANALYSIS;

ALBUMIN; HEXADECYLTRICHLOROSILANES; SELF-ASSEMBLED MONOLAYERS (SAM);

PROTEINS;

EID: 0032482854     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la970916s     Document Type: Article

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