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Scripta Materialia

Volumn 63, Issue 6, 2010, Pages 605-608

Phase evolution and photoluminescence in as-deposited amorphous silicon nitride films

(6) Singh, Sarab Preet a Srivastava, P a Ghosh, S a Khan, S A b Oton, Claudio J c Prakash, G Vijaya a

a INDIAN INSTITUTE OF TECHNOLOGY DELHI (India)

b INTER UNIVERSITY ACCELERATOR CENTRE (India)

c UNIVERSITY OF SOUTHAMPTON (United Kingdom)

Author keywords

Phase stabilization; Photoluminescence; Silicon nanocrystals; Silicon nitride

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; GAS FLOWRATE; HYDROGENATED AMORPHOUS SILICON; IN-SITU FORMATIONS; PHASE CHANGE; PHASE EVOLUTIONS; PHASE STABILIZATION; QUANTUM CONFINEMENT EFFECTS; SI NANOCLUSTER; SILICON NANOCLUSTERS; SILICON NANOCRYSTALS; SILICON NITRIDE MATRIX; SILICON OXYNITRIDES; SPECTRAL FEATURE; SYSTEMATIC STUDY;

AMORPHOUS FILMS; MILITARY PHOTOGRAPHY; NANOCLUSTERS; NANOCRYSTALS; PHOTOLUMINESCENCE; SILICON NITRIDE; STABILIZATION;

AMORPHOUS SILICON;

EID: 77955293876 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2010.05.049 Document Type: Article

Times cited : (13)

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