Nanocrystal formation in annealed a-SiO0.17N0.07:H films

Nanotechnology

Volumn 15, Issue 12, 2004, Pages 1831-1836

  Kohli, Sandeep ^a   Theil, Jeremy A ^b   Dippo, Patricia C ^c   Jones, K M ^c   Al Jassim, Mowafak M ^c   Ahrenkiel, Richard K ^c   Rithner, Christopher D ^a   Dorhout, Peter K ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b AGILENT TECHNOLOGIES   (United States)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COALESCENCE; HYDROGENATION; NANOSTRUCTURED MATERIALS; SILICON COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLITES; GROWTH MECHANISM; NANOCRYSTAL FORMATION; OXYNITRIDES;

THIN FILMS;

EID: 11144348001     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/12/024     Document Type: Review

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