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Volumn 312, Issue 16-17, 2010, Pages 2459-2464

Comparison of charge generation from hot wires between AC and DC power supply and its effect on deposition behavior during hot-wire chemical vapor deposition of silicon

(4) Park, Soon Young a You, Shin Jae b Kim, Chan Soo a Hwang, Nong Moon a

a Seoul National University (South Korea)

b Korea Research Institute of Standards and Science (South Korea)

Author keywords

A1. Nanostructure; A3. Chemical vapor deposition processes; A3. Polycrystalline film; B2. Semiconducting silicon

Indexed keywords

A3. POLYCRYSTALLINE FILM; AC POWER; B2. SEMICONDUCTING SILICON; CHARGE GENERATION; CHEMICAL VAPOR DEPOSITION PROCESS; CRYSTALLINE FRACTIONS; CRYSTALLINITIES; DC BIAS; DC POWER; DC POWER SUPPLIES; DEPOSITION BEHAVIOR; HOT WIRE CHEMICAL VAPOR DEPOSITION; HOT WIRES; MEASURED CURRENTS; NEGATIVE CURRENTS; POLYCRYSTALLINE FILM; POWER SUPPLY; PROCESSING CONDITION; REACTANT GAS; REACTOR PRESSURES; WIRE TEMPERATURE;

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; ELECTRIC GENERATORS; ELECTRIC POWER MEASUREMENT; ELECTRIC POWER SYSTEMS; NANOSTRUCTURES; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; WIRE;

DC POWER TRANSMISSION;

EID: 77955278088 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.05.023 Document Type: Article

Times cited : (7)

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