Nanopore fabrication in amorphous Si: Viscous flow model and comparison to experiment

Journal of Applied Physics

Volumn 108, Issue 1, 2010, Pages

  George, H Bola ^a   Tang, Yuye ^b   Chen, Xi ^b   Li, Jiali ^c   Hutchinson, John W ^a   Golovchenko, Jene A ^a   Aziz, Michael J ^a  

^a HARVARD UNIVERSITY   (United States)

^b Columbia University ^*  (United States)

^c UNIVERSITY OF ARKANSAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADATOM DIFFUSION; AMORPHOUS SI; AMORPHOUS SILICON THIN FILMS; ANALYTICAL APPROXIMATION; ARGON ION IRRADIATION; BIOMOLECULE DETECTION; CROSS-SECTION MORPHOLOGY; EXPERIMENTAL DATA; FINITE ELEMENT SOLUTION; FINITE-ELEMENT; FLUENCES; IN-SITU; LARGE DEFORMATIONS; MEMORY EFFECTS; VISCOUS-FLOW MODELS;

AMORPHOUS FILMS; ARGON; DEFORMATION; FINITE ELEMENT METHOD; NANOPORES; SEMICONDUCTING SILICON COMPOUNDS; VISCOSITY; VISCOUS FLOW;

AMORPHOUS SILICON;

EID: 77955213396     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3452390     Document Type: Article

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