Focused ion beam induced deflections of freestanding thin films

Journal of Applied Physics

Volumn 100, Issue 10, 2006, Pages

  Kim, Y R ^a,b   Chen, P ^a,c   Aziz, M J ^a   Branton, D ^a   Vlassak, J J ^a  

^a HARVARD UNIVERSITY   (United States)

^b Nanyang Technological University   (Singapore)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPRESSIVE STRESS; CONTINUUM MECHANICS; ION BEAMS; MATHEMATICAL MODELS; SILICON NITRIDE;

ION DOSES; ION ENERGIES; MEMBRANE DEFLECTIONS; SILICON NITRIDE THIN MEMBRANES;

THIN FILMS;

EID: 33845194139     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2363900     Document Type: Article

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