Ion beam-induced anisotropic plastic deformation at 300 keV

Applied Physics Letters

Volumn 83, Issue 21, 2003, Pages 4315-4317

  Van Dillen, T ^a   Polman, A ^a   Van Kats, C M ^b   Van Blaaderen, A ^b  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDS; COPPER; ELECTRON ENERGY LEVELS; ION BEAMS; ION BOMBARDMENT; PARTICLE ACCELERATORS; PLASTIC DEFORMATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; STRAIN; TEMPERATURE; XENON;

ANISOTROPIC PLASTIC DEFORMATION; SPHERICAL COLLOIDAL SILICA PARTICLES; TRANSVERSE PLASTIC STRAIN;

FUSED SILICA;

EID: 0346885943     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1629793     Document Type: Article

References (13)

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13. Such a beam heating effect caused by high beam current and possibly poor heat contact between sample and substrate holder in most likely the origin of an earlier claim that deformation would not occur at 500 keV Xe irradiation [E. Snoeks, A. van Blaaderen, T. van Dillen, C. M. van Kats, M. L. Brongersma, and A. Polman, Adv. Mater. (Weinheim, Ger.) 12, 1511 (2000)].