-
1
-
-
42249108438
-
Mechanism of boron diffusion in amorphous silicon
-
DOI 10.1103/PhysRevLett.100.155901
-
S. Mirabella, D. De Salvador, E. Bruno, E. Napolitani, E. F. Pecora, S. Boninelli, and F. Priolo, Phys. Rev. Lett. PRLTAO 0031-9007 100, 155901 (2008). 10.1103/PhysRevLett.100.155901 (Pubitemid 351549478)
-
(2008)
Physical Review Letters
, vol.100
, Issue.15
, pp. 155901
-
-
Mirabella, S.1
De Salvador, D.2
Bruno, E.3
Napolitani, E.4
Pecora, E.F.5
Boninelli, S.6
Priolo, F.7
-
3
-
-
69249202260
-
-
VACUAV 0042-207X, 10.1016/j.vacuum.2009.06.007
-
A. Lakatos, A. Csik, G. A. Langer, G. Erdelyi, G. L. Katona, L. Daroczi, K. Vad, J. Toth, and D. L. Beke, Vacuum VACUAV 0042-207X 84, 130 (2009). 10.1016/j.vacuum.2009.06.007
-
(2009)
Vacuum
, vol.84
, pp. 130
-
-
Lakatos, A.1
Csik, A.2
Langer, G.A.3
Erdelyi, G.4
Katona, G.L.5
Daroczi, L.6
Vad, K.7
Toth, J.8
Beke, D.L.9
-
4
-
-
34147142907
-
Subnanometer-scale measurements of the interaction of ultrafast soft X-ray free-electron-laser pulses with matter
-
DOI 10.1103/PhysRevLett.98.145502
-
S. P. Hau-Riege, H. N. Chapman, J. Krzywinski, R. Sobierajski, S. Bajt, R. A. London, M. Bergh, C. Caleman, R. Nietubyc, L. Juha, J. Kuba, E. Spiller, S. Baker, R. Bionta, K. S. Tinten, N. Stojanovic, B. Kjornrattanawanich, E. Gullikson, E. Plönjes, S. Toleikis, and T. Tschentscher, Phys. Rev. Lett. PRLTAO 0031-9007 98, 145502 (2007). 10.1103/PhysRevLett.98.145502 (Pubitemid 46557461)
-
(2007)
Physical Review Letters
, vol.98
, Issue.14
, pp. 145502
-
-
Hau-Riege, S.P.1
Chapman, H.N.2
Krzywinski, J.3
Sobierajski, R.4
Bajt, S.5
London, R.A.6
Bergh, M.7
Caleman, C.8
Nietubyc, R.9
Juha, L.10
Kuba, J.11
Spiller, E.12
Baker, S.13
Bionta, R.14
Sokolowski Tinten, K.15
Stojanovic, N.16
Kjornrattanawanich, B.17
Gullikson, E.18
Plonjes, E.19
Toleikis, S.20
Tschentscher, T.21
more..
-
5
-
-
36849086367
-
-
PLRBAQ 0556-2805, 10.1103/PhysRevB.76.245404
-
I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, Phys. Rev. B PLRBAQ 0556-2805 76, 245404 (2007). 10.1103/PhysRevB.76.245404
-
(2007)
Phys. Rev. B
, vol.76
, pp. 245404
-
-
Nedelcu, I.1
Van De Kruijs, R.W.E.2
Yakshin, A.E.3
Bijkerk, F.4
-
6
-
-
62149090246
-
-
DDAFE7 1012-0386, 10.4028/www.scientific.net/DDF.283-286
-
S. Bruijn, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, Defect Diffus. Forum DDAFE7 1012-0386 283-286, 657 (2009). 10.4028/www.scientific.net/ DDF.283-286
-
(2009)
Defect Diffus. Forum
, vol.283-286
, pp. 657
-
-
Bruijn, S.1
Van De Kruijs, R.W.E.2
Yakshin, A.E.3
Bijkerk, F.4
-
7
-
-
60349108263
-
-
APPLAB 0003-6951, 10.1063/1.3081034
-
V. I. T. A. de Rooij-Lohmann, A. W. Kleyn, F. Bijkerk, H. H. Brongersma, and A. E. Yakshin, Appl. Phys. Lett. APPLAB 0003-6951 94, 063107 (2009). 10.1063/1.3081034
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 063107
-
-
De Rooij-Lohmann, V.I.T.A.1
Kleyn, A.W.2
Bijkerk, F.3
Brongersma, H.H.4
Yakshin, A.E.5
-
9
-
-
0037446388
-
-
ASUSEE 0169-4332, 10.1016/S0169-4332(03)00148-X
-
P. Reinig, F. Fenske, W. Fuhs, A. Schöpke, and B. Selle, Appl. Surf. Sci. ASUSEE 0169-4332 210, 301 (2003). 10.1016/S0169-4332(03)00148-X
-
(2003)
Appl. Surf. Sci.
, vol.210
, pp. 301
-
-
Reinig, P.1
Fenske, F.2
Fuhs, W.3
Schöpke, A.4
Selle, B.5
-
10
-
-
0025625753
-
-
JMREEE 0884-2914, 10.1557/JMR.1990.2854
-
C. M. Doland and R. J. Nemanich, J. Mater. Res. JMREEE 0884-2914 5, 2854 (1990). 10.1557/JMR.1990.2854
-
(1990)
J. Mater. Res.
, vol.5
, pp. 2854
-
-
Doland, C.M.1
Nemanich, R.J.2
-
11
-
-
33846794479
-
-
SSREDI 0167-5729, 10.1016/j.surfre2006.12.002
-
H. H. Brongersma, M. Draxler, M. de Ridder, and P. Bauer, Surf. Sci. Rep. SSREDI 0167-5729 62, 63 (2007). 10.1016/j.surfrep.2006.12.002
-
(2007)
Surf. Sci. Rep.
, vol.62
, pp. 63
-
-
Brongersma, H.H.1
Draxler, M.2
De Ridder, M.3
Bauer, P.4
-
12
-
-
4243209938
-
-
PRLTAO 0031-9007, 10.1103/PhysRevLett.89.263201
-
M. Draxler, R. Gruber, H. H. Brongersma, and P. Bauer, Phys. Rev. Lett. PRLTAO 0031-9007 89, 263201 (2002). 10.1103/PhysRevLett.89.263201
-
(2002)
Phys. Rev. Lett.
, vol.89
, pp. 263201
-
-
Draxler, M.1
Gruber, R.2
Brongersma, H.H.3
Bauer, P.4
-
13
-
-
36549094587
-
-
JAPIAU 0021-8979, 10.1063/1.343425
-
K. Holloway, K. B. Do, and R. Sinclair, J. Appl. Phys. JAPIAU 0021-8979 65, 474 (1989). 10.1063/1.343425
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 474
-
-
Holloway, K.1
Do, K.B.2
Sinclair, R.3
-
14
-
-
17144437734
-
-
THSFAP 0040-6090, 10.1016/S0040-6090(03)01028-9
-
T. Böttger, D. C. Meyer, P. Paufler, S. Braun, M. Moss, H. Mai, and E. Beyer, Thin Solid Films THSFAP 0040-6090 444, 165 (2003). 10.1016/S0040-6090(03)01028-9
-
(2003)
Thin Solid Films
, vol.444
, pp. 165
-
-
Böttger, T.1
Meyer, D.C.2
Paufler, P.3
Braun, S.4
Moss, M.5
Mai, H.6
Beyer, E.7
-
15
-
-
66549084461
-
-
JAPIAU 0021-8979, 10.1063/1.3126497
-
T. Tsarfati, E. Zoethout, R. van de Kruijs, and F. Bijkerk, J. Appl. Phys. JAPIAU 0021-8979 105, 104305 (2009). 10.1063/1.3126497
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 104305
-
-
Tsarfati, T.1
Zoethout, E.2
Van De Kruijs, R.3
Bijkerk, F.4
-
16
-
-
61549107607
-
-
NIMAER 0168-9002, 10.1016/j.nima.2008.12.244
-
M. Gorgoi, S. Svensson, F. Schäfers, G. Öhrwall, M. Mertin, P. Bressler, O. Karis, H. Siegbahn, A. Sandell, H. Rensmo, W. Doherty, C. Jung, W. Braun, and W. Eberhardt, Nucl. Instrum. Methods Phys. Res. A NIMAER 0168-9002 601, 48 (2009). 10.1016/j.nima.2008.12.244
-
(2009)
Nucl. Instrum. Methods Phys. Res. A
, vol.601
, pp. 48
-
-
Gorgoi, M.1
Svensson, S.2
Schäfers, F.3
Öhrwall, G.4
Mertin, M.5
Bressler, P.6
Karis, O.7
Siegbahn, H.8
Sandell, A.9
Rensmo, H.10
Doherty, W.11
Jung, C.12
Braun, W.13
Eberhardt, W.14
-
17
-
-
37649005559
-
-
RSINAK 0034-6748, 10.1063/1.2808334
-
F. Schaefers, M. Mertin, and M. Gorgoi, Rev. Sci. Instrum. RSINAK 0034-6748 78, 123102 (2007). 10.1063/1.2808334
-
(2007)
Rev. Sci. Instrum.
, vol.78
, pp. 123102
-
-
Schaefers, F.1
Mertin, M.2
Gorgoi, M.3
-
18
-
-
77955210754
-
-
The Si-oxide peak in Fig. has actually increased due to the annealing treatment. This is attributed to postannealing exposure to the ambient. A rougher (see Fig.) and possibly more open structure are probable causes of the increased degree of oxidation
-
The Si-oxide peak in Fig. has actually increased due to the annealing treatment. This is attributed to postannealing exposure to the ambient. A rougher (see Fig.) and possibly more open structure are probable causes of the increased degree of oxidation.
-
-
-
-
19
-
-
0018040032
-
An XPS study of the adherence of refractory carbide silicide and boride rf-sputtered wear-resistant coatings
-
DOI 10.1116/1.569845
-
W. A. Brainard and D. R. Wheeler, J. Vac. Sci. Technol. JVSTAL 0022-5355 15, 1800 (1978). 10.1116/1.569845 (Pubitemid 9423832)
-
(1978)
J Vac Sci Technol
, vol.15
, Issue.6
, pp. 1800-1805
-
-
Brainard William, A.1
Wheeler Donald, R.2
-
20
-
-
0037076188
-
TEM and SEM studies of microstructural transformations of thin iron films during annealing
-
DOI 10.1016/S0169-4332(02)00016-8, PII S0169433202000168
-
W. Lisowski, E. G. Keim, and M. Smithers, Appl. Surf. Sci. ASUSEE 0169-4332 189, 148 (2002). 10.1016/S0169-4332(02)00016-8 (Pubitemid 34740833)
-
(2002)
Applied Surface Science
, vol.189
, Issue.1-2
, pp. 148-156
-
-
Lisowski, W.1
Keim, E.G.2
Smithers, M.3
-
21
-
-
0003569073
-
-
(Wiley, New York)
-
I. Kaur, Y. Mishin, and M. Gust, Fundamentals of Grain and Interphase Boundary Diffusion (Wiley, New York, 1995), p. 528.
-
(1995)
Fundamentals of Grain and Interphase Boundary Diffusion
, pp. 528
-
-
Kaur, I.1
Mishin, Y.2
Gust, M.3
-
22
-
-
4644258900
-
-
ASUSEE 0169-4332, 10.1016/j.apsusc.2004.05.176
-
A. Patelli, J. Ravagnan, V. Rigato, G. Salmaso, D. Silvestrini, E. Bontempi, and L. E. Depero, Appl. Surf. Sci. ASUSEE 0169-4332 238, 262 (2004). 10.1016/j.apsusc.2004.05.176
-
(2004)
Appl. Surf. Sci.
, vol.238
, pp. 262
-
-
Patelli, A.1
Ravagnan, J.2
Rigato, V.3
Salmaso, G.4
Silvestrini, D.5
Bontempi, E.6
Depero, L.E.7
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