Mechanism of boron diffusion in amorphous silicon

Physical Review Letters

Volumn 100, Issue 15, 2008, Pages

  Mirabella, Salvatore ^a   De Salvador, Davide ^b   Bruno, Elena ^a   Napolitani, Enrico ^b   Pecora, Emanuele F ^a,c   Boninelli, Simona ^a   Priolo, Francesco ^a,c  

^a UNIVERSITY OF CATANIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c SCUOLA SUPERIORE DI CATANIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS SILICON; BORON; CONCENTRATION (PROCESS);

DANGLING BONDS (DB); SI RELAXATION;

DIFFUSION;

EID: 42249108438     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.100.155901     Document Type: Article

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