Crystalline silicon films sputtered on molybdenum: A study of the silicon-molybdenum interface

Applied Surface Science

Volumn 210, Issue 3-4, 2003, Pages 301-306

  Reinig, P ^a   Fenske, F ^a   Fuhs, W ^a   Schopke A ^a   Selle, B ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Polycrystalline silicon; Pulsed sputtering; Raman spectroscopy; Rutherford backscattering spectroscopy; Silicide; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; FILM GROWTH; INTERFACES (MATERIALS); MOLYBDENUM; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTERING; SUBSTRATES;

SILICON FILMS;

THIN FILMS;

EID: 0037446388     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00148-X     Document Type: Article

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