Structure and interface properties of Mo/B 4 C/Si multilayers deposited by rf-magnetron sputtering

Applied Surface Science

Volumn 238, Issue 1-4 SPEC. ISS., 2004, Pages 262-268

  Patelli, A ^a,b   Ravagnan, J ^a   Rigato, V ^a   Salmaso, G ^a   Silvestrini, D ^a   Bontempi, E ^c   Depero, L E ^c  

^a LABORATORI NAZIONALI DI LEGNARO   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c UNIVERSITY OF BRESCIA   (Italy)

Author keywords

Diffusion barrier; Ion assisted deposition; Mo Si multilayers; Rf magnetron sputtering; X ray mirrors

Indexed keywords

BORON COMPOUNDS; DIFFUSION; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; MOLYBDENUM; MULTILAYERS; SILICON; SPUTTER DEPOSITION; X RAY DIFFRACTION;

DIFFUSION BARRIER; MO/SI MULTILAYERS; RF-MAGNETRON SPUTTERING; X-RAY MIRRORS;

SURFACE CHEMISTRY;

EID: 4644258900     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.176     Document Type: Conference Paper

References (20)

1. Solar Orbiter, A high resolution mission to the sun and inner heliosphere, Assessment Study Report, vol. 6, ESA-SCI, 2000, p. 2000.
2. J.-P. Delaboudiniére, et al., in: SPIE Proceedings, vol. 1742, 1992, p. 296.
3. Hawryluk A.M., Sappala L.G. J. Vac. Sci. Technol. B. 6:1988;2162.
4. E. Spiller, Soft X-ray Optics, SPIE Optical Engineering Press, Bellingham, Washington, DC, 1994, pp. 183-184.
5. S. Bajt, J. Alameda, T. Barbee, et al., in: D.A. Tichenor, J.A. Folta (Eds.), Soft X-ray and EUV Imaging Systems II, vol. 4506, SPIE, San Diego, CA, 2001, p. 65.
6. Braun St., Mai H., Moss M., Scholtz R., Leson A. Jpn. J. Appl. Phys. 41:2002;4074-4081.
7. Windt D.L., Hull R., Waskiewicz W.K. J. Appl. Phys. 71:1992;2675.
8. Rigato V., Patelli A., Maggioni G., et al. Surf. Coat. Technol. 40:2003;174-175.
9. Birch J., Ericksson F., Johansson G.A., et al. Vacuum. 68:2003;275.
10. V. Rigato, A. Patelli, X-ray and Inner-Shell Processes, vol. 652, AIP, Rome, Italy, 2002, p. 103.
11. Hopkins M.B., Graham W.G. Rev. Sci. Instrum. 57(9):1986;2210.
12. Liu J.R., Zheng Z.S., Chu W.K. Nucl. Instrum. Methods B. 108:1996;1.
13. Feng Y., Zhou Z., Zhou Y., Zhou G. Nucl. Instrum. Methods B. 86:1994;225.
14. Liu J., Lu X., Wang X., et al. Nucl. Instrum. Methods B. 190:2002;107.
15. Bajt S., Stearns D.G., Kearney P.A. J. Appl. Phys. 90:2001;1017.
16. Kopilets I.A., Kondratenko V.V., Fedorenko A.I., et al. J. X-ray Sci. Technol. 6:1996;141-149.
17. Costa e Silva A., Kaufman M.J. Intermetallics. 5:1997;1-15.
18. T.W. Barbee, S. Bajt, The Regents of the University of California, Oakland, CA, US Patent 6,396,900 (2002).
19. V. Holý, U. Pietsch, T. Baumbach, High-resolution X-ray Scattering from Thin Films and Multilayers, Springer, Heidelberg, 1999.
20. Stearns D.G., Guillikson E.M. Physica B. 283:2000;84.