Development of graded low friction SiCN coatings with extended high temperature stability above 1200°C

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Hoche, Holger ^a   Allebrandt, Daniel ^a   Riedel, Ralf ^a   Fasel, Claudia ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Degradation; Physical vapour deposition (PVD); SiCN; Thermal properties

Indexed keywords

CHEMICAL COMPOSITIONS; CHEMICAL DECOMPOSITION; COATING HARDNESS; COEFFICIENT OF FRICTIONS; CONCEPT-BASED; DEPOSITION PARAMETERS; GRADED COATING; HIGH TEMPERATURE STABILITY; LOW FRICTION; PHYSICAL VAPOUR DEPOSITION; SICN; STRUCTURAL CHANGE; SURFACE OXIDATIONS; THERMAL PROPERTIES;

CHEMICAL STABILITY; DEGRADATION; FRICTION; THERMODYNAMIC PROPERTIES;

COATINGS;

EID: 77954917956     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931709     Document Type: Conference Paper

References (31)

1. T. Kacsich, K.-P. Lieb, Thin Solid Films 1994, 235, 4.
2. C. Emsberger, J. Nickerson, T. Smith, A. E. Miller, D. Banks, J. Vac. Sci. Technol. 1986, A4, 2784.
3. D. Mocaer, R. Pailler, R. Naslain, C. Richard, J. P. Pillot, J. Dunogues, C. Gerardin, F. Taulelle, J. Mater. Sci. 1993, 28, 2615.
4. C. Haluschka, H.-J. Kleebe, R. Franke, R. Riedel, J. Europ. Ceram. Soc. 2000, 20, 1355.
5. R. Riedel, H.-J. Kleebe, H. Schönfelder, F. Aldinge, Nature 1995, 374, 526.
6. R. Raj, L. An, S. Shah, R. Riedel, C. Fasel, H. J. Kleebe, J. Am. Ceram. Soc. 2001, 84, 1803.
7. R. Riedel, L. M. Ruwisch, L. An, R. Raj, J. Am. Ceram. Soc. 1998, 81, 3341.
8. A. L. Baia Neto, R. A. Santos, F. L. Freire, Jr., S. S. Camargo, Jr., R. Carius, F. Finger, W. Beye, Thin Solid Films 1997, 293, 206.
9. K. B. Sundaram, Z. Alizadeh, R. M. Todi, V. H. Desai, Mater. Sci. Eng. 2004, 368, 103.
10. D. Bielinski, A. M. Wrobel, A. Walkiewicz-Pietrzykowska, Tribol. Lett. 2002, 13, 71.
11. C. Donnet, L. Ponsonnet, A. Fernández Diamond, Diamond Relat. Mater. 2002, 11, 169.
12. D. Probst, H. Hoche, Y. Zhou, R. Hauser, T. Stelzner, H. Scheerer, E. Broszeit, C. Berger, R. Riedel, H. Stafast, E. Kroke, Surf. Coat. Technol. 2005, 200, 1-4, 355.
13. X. Xiao, Y. Li, L. Song, X. Peng, X. Hu, Appl. Surf. Sci. 2000, 156, 155.
14. X. Peng, L Song, J. Meng, Y. Zhang, X. Hu, Appl. Surf. Sci. 2001, 173, 313.
15. K. B. Sundaram, J. Alizadeh, Thin Solid Films 2000, 370, 151.
16. R. Machorro, E. C. Samano, G. Soto, L. Cata, Appl. Surf. Sci. 1998, 127-129, 564.
17. I. Kleps, A. Angelescu, F. Caccavale, G. Brusatin, L Armelao, Vacuum 1995, 46, 979.
18. L. Y. Chen, F. C. N. Hong, Diamond Relat. Mater. 2003, 12, 968.
19. N. I. Fainer, Yu. M. Rumyantsev, A. N. Golubenko, M. L. Kosinova, F. A. Kuznetsov, J. Cryst. Growth 2003, 248, 175.
20. G. Marx, K.-U. Koerner, P. Heger, Steel Res. 2001, 72, 518.
21. J. Wilden, A. Wank, M. Asmann, J. V. R. Heberlein, M. I. Boulos, F. Gitzhofer, Appl. Organomet Chem. 2001, 15, 841.
22. D. H. Kuo, D. G. Yang, Thin Solid Films 2000, 374, 92.
23. [23a] A. Bendeddouche, A. Berjoan, E. Beche, T. Merle-Mejean, S. Schamm, V. Serin, G. Taillades, A. Pradel, R. Hillel, J. Appl. Phys. 1997, 81, 6147;
24. [23b] A. Bendeddouche, R. Berjoan, E. Beche, R. Hillel, Surf. Coat. Technol. 1999, 111, 184.
25. K. Kamata, Y. Maeda, M. Moriyama, J. Mater. Sci. Lett. 1986, 5, 1051.
26. W. Zhang, J. T. Wang, Surf. Coat. Technol. 1991, 50, 11.
27. L. C. Chen, K. H. Chen, S. L. Wei, P. D. Kichambare, J. J. Wu, T. R. Lu, C. T. Kuo, Thin Solid Films 1999, 355/356, 112.
28. K. H. Chen, J. J. Wu, C. Y. Chen, L. C. Chen, C. W. Fan, P. F. Kuo, Y. F. Chen, Y. S. Huang, Thin Solid Films 1999, 355/356, 205.
29. D. Allebrandt, Herstellung und Charakterisierung amorpher SiCN Schichten unter technologischen Aspekten in Hinblick auf tribologische Beanspruchung, Dissertation TU-Darmstadt D17, Shaker-Verlag 2008.
30. H. Hoche, D. Allebrandt, M Bruns, Ralf Hauser, C. Fasel, Surf. Coat. Technol. 2008, 202, 5567.
31. D. Bahloul-Hourlier, B. Doucey, E. Laborde, O. Goursat, J. Mater. Chem. 2001, 11, 2028.